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Strong electron-hole symmetric Rashba spin-orbit coupling in graphene/monolayer transition metal dichalcogenide heterostructures

机译:强电子 - 空穴对称Rashba自旋 - 轨道耦合   石墨烯/单层过渡金属二硫族化物异质结构

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摘要

Despite its extremely weak intrinsic spin-orbit coupling (SOC), graphene hasbeen shown to acquire considerable SOC by proximity coupling with exfoliatedtransition metal dichalcogenides (TMDs). Here we demonstrate strong inducedRashba SOC in graphene that is proximity coupled to a monolayer TMD film, MoS2or WSe2, grown by chemical vapor deposition with drastically different Fermilevel positions. Graphene/TMD heterostructures are fabricated with apickup-transfer technique utilizing hexagonal boron nitride, which serves as aflat template to promote intimate contact and therefore a strong interfacialinteraction between TMD and graphene as evidenced by quenching of the TMDphotoluminescence. We observe strong induced graphene SOC that manifests itselfin a pronounced weak anti-localization (WAL) effect in the graphenemagnetoconductance. The spin relaxation rate extracted from the WAL analysisvaries linearly with the momentum scattering time and is independent of thecarrier type. This indicates a dominantly Dyakonov-Perel spin relaxationmechanism caused by the induced Rashba SOC. Our analysis yields a Rashba SOCenergy of ~1.5 meV in graphene/WSe2 and ~0.9 meV in graphene/MoS2,respectively. The nearly electron-hole symmetric nature of the induced RashbaSOC provides a clue to possible underlying SOC mechanisms.
机译:尽管石墨烯的固有自旋轨道耦合(SOC)非常弱,但它已显示出通过与脱落的过渡金属二卤化物(TMD)进行邻近耦合而获得了可观的SOC。在这里,我们展示了石墨烯中强烈诱导的Rashba SOC,该石墨烯与单层TMD薄膜MoS2或WSe2邻近耦合,该薄膜是通过化学气相沉积法在费米能级位置上完全不同而生长的。石墨烯/ TMD异质结构是利用六方氮化硼通过磷灰石转移技术制造的,该结构用作扁平模板以促进紧密接触,因此通过TMD光致发光淬灭证明了TMD和石墨烯之间的强界面相互作用。我们观察到强诱导的石墨烯SOC在石墨烯磁导中表现出明显的弱的抗局部定位(WAL)效应。从WAL分析中提取的自旋弛豫率随动量散射时间线性变化,并且与载流子类型无关。这表明由诱导的Rashba SOC引起的Dyakonov-Perel自旋弛豫机制占主导地位。我们的分析得出,石墨烯/ WSe2中的Rashba SOC能量分别为〜1.5 meV和石墨烯/ MoS2中的〜0.9 meV。诱导的RashbaSOC的几乎电子空穴对称性质为可能的潜在SOC机制提供了线索。

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